Physical vapour deposition PVD
{"Image DocumentName": "Physical vapour deposition PVD", "Image ImageDescription": "Variants of PVD include, in order of increasing novelty: Evaporative deposition: In which the material to be deposited is heated to a high vapor pressure by electrically resistive heating in low vacuum. Electron beam physical vapor deposition: In which the material to be deposited is heated to a high vapor pressure by electron bombardment in high vacuum. Sputter deposition: In which a glow plasma discharge (usually localized around the target by a magnet) bombards the material sputtering some away as a vapor. Cathodic Arc Deposition: In which a high power arc directed at the target material blasts away some into a vapor. Pulsed laser deposition: In which a high power laser ablates material from the target into a vapor.", "Image XResolution": "37", "Image YResolution": "37", "Image ResolutionUnit": "Pixels/Centimeter", "Image Software": "SlidePlayer", "Image YCbCrPositioning": "Centered"}