Wafer Handling Stages – Increase the Rate of Wafer Inspection Whilst Reducing Error
{"Image ImageDescription": "4 T", "Image Orientation": "Horizontal (normal)", "Image Software": "Adobe Photoshop CS5.1 Macintosh", "Image DateTime": "2013:10:24 12:57:41", "Image ExifOffset": "2222", "Image XPTitle": "[52, 0, 32, 0, 84, 0, 0, 0]", "Image XPSubject": "[52, 0, 32, 0, 84, 0, 0, 0]", "Image Padding": "[]", "EXIF DateTimeOriginal": "2001:08:07 18:11:01", "EXIF DateTimeDigitized": "2001:08:07 18:11:01", "EXIF SubSecTimeOriginal": "00", "EXIF SubSecTimeDigitized": "00", "EXIF ColorSpace": "Uncalibrated", "EXIF ExifImageWidth": "401", "EXIF ExifImageLength": "224", "EXIF Padding": "[]"}