How the Geneva Act of the Hague Agreement Will Help Protect U.S. Patent Applicants  by Silvia Salvadori, PhD.
{"Image ImageWidth": "5300", "Image ImageLength": "3222", "Image BitsPerSample": "[8, 8, 8]", "Image PhotometricInterpretation": "2", "Image ImageDescription": "Patent Industry Global Standard on 3D Map", "Image Orientation": "Horizontal (normal)", "Image Tag 0x0000": "0", "Image XResolution": "72", "Image YResolution": "72", "Image ResolutionUnit": "Pixels/Inch", "Image Software": "Adobe Photoshop CS5 Windows", "Image DateTime": "2013:06:05 13:55:13", "Image ExifOffset": "284", "Thumbnail Compression": "JPEG (old-style)", "Thumbnail XResolution": "72", "Thumbnail YResolution": "72", "Thumbnail ResolutionUnit": "Pixels/Inch", "Thumbnail JPEGInterchangeFormat": "434", "Thumbnail JPEGInterchangeFormatLength": "0", "EXIF ExifVersion": "0221", "EXIF ColorSpace": "Uncalibrated", "EXIF ExifImageWidth": "5300", "EXIF ExifImageLength": "3222"}