(Left panel) SHIM images of graphene-based pads that have been fabricated using direct-write He+ lithography.(Top left) Nonconducting graphene pad due to insufficient supply of electrons through the thin conducting graphene strip (~10 nm). (Middle left) Onset of slight conduction in graphene pad as the width of the conducting strip is increased to 12 nm. Thermal noise is also evident in the pad. (Bottom left) Fully conducting graphene pad with conducting strip width of 14 nm. (Right panel) SEM images of the exact same structures indicating insufficient electrons in the graphene pads (top and middle right) are compensated by the electron beam. Scale bar is 50 nm.
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